Discipline | Microlithography, nanolithography, metrology |
---|---|
Language | English |
Edited by | Harry Levinson |
Publication details | |
Former name(s) |
|
History | 2002–present |
Publisher | |
Frequency | Quarterly |
2.3 (2022) | |
Standard abbreviations | |
ISO 4 | J. Micro/Nanopatterning Mater. Metrol. |
Indexing | |
CODEN | JMMMIH |
ISSN |
1932-5150 (print) 2708-8340 (web) |
OCLC no. | 1249108189 |
Links | |
Journal of Micro/Nanopatterning, Materials, and Metrology is a peer-reviewed scientific journal published quarterly by SPIE. It covers science, development, and practice of micro and nanofabrication processes and metrology. [1] Established in 2002 under the name Journal of Microlithography, Microfabrication, and Microsystems, it was subsequently retitled to Journal of Micro/Nanolithography, MEMS, and MOEMS in 2007. The journal title was changed to its current name in 2021. [2]
The editor-in-chief of the journal is Harry Levinson (HJL Lithography). [1]
The journal is abstracted and indexed in:
According to the Journal Citation Reports, the journal has a 2022 impact factor of 2.3. [8]
Discipline | Microlithography, nanolithography, metrology |
---|---|
Language | English |
Edited by | Harry Levinson |
Publication details | |
Former name(s) |
|
History | 2002–present |
Publisher | |
Frequency | Quarterly |
2.3 (2022) | |
Standard abbreviations | |
ISO 4 | J. Micro/Nanopatterning Mater. Metrol. |
Indexing | |
CODEN | JMMMIH |
ISSN |
1932-5150 (print) 2708-8340 (web) |
OCLC no. | 1249108189 |
Links | |
Journal of Micro/Nanopatterning, Materials, and Metrology is a peer-reviewed scientific journal published quarterly by SPIE. It covers science, development, and practice of micro and nanofabrication processes and metrology. [1] Established in 2002 under the name Journal of Microlithography, Microfabrication, and Microsystems, it was subsequently retitled to Journal of Micro/Nanolithography, MEMS, and MOEMS in 2007. The journal title was changed to its current name in 2021. [2]
The editor-in-chief of the journal is Harry Levinson (HJL Lithography). [1]
The journal is abstracted and indexed in:
According to the Journal Citation Reports, the journal has a 2022 impact factor of 2.3. [8]