Original file (SVG file, nominally 512 × 2,560 pixels, file size: 8 KB)
Click on a date/time to view the file as it appeared at that time.
Date/Time | Thumbnail | Dimensions | User | Comment | |
---|---|---|---|---|---|
current | 08:27, 17 April 2022 |
![]() | 512 × 2,560 (8 KB) | Djiboun | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for fr. |
13:18, 20 June 2020 |
![]() | 512 × 2,560 (5 KB) | Mega deppa | Reverted to version as of 16:52, 9 October 2011 (UTC) | |
13:16, 20 June 2020 |
![]() | 512 × 2,560 (8 KB) | Mega deppa | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for ja. | |
16:52, 9 October 2011 |
![]() | 512 × 2,560 (5 KB) | Cmglee | Align text, change enumeration and change colour to match Image:CMOS_fabrication_process.svg. | |
22:03, 30 September 2011 |
![]() | 512 × 2,560 (5 KB) | Cmglee | Merge develop and remove exposed photoresist. | |
22:46, 29 September 2011 |
![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:39, 29 September 2011 |
![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:37, 29 September 2011 |
![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:30, 29 September 2011 |
![]() | 512 × 3,413 (5 KB) | Cmglee | {{Information |Description ={{en|1=Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. }} |Source ={{own}} |Author = Cmglee |Date |
The following other wikis use this file:
Original file (SVG file, nominally 512 × 2,560 pixels, file size: 8 KB)
Click on a date/time to view the file as it appeared at that time.
Date/Time | Thumbnail | Dimensions | User | Comment | |
---|---|---|---|---|---|
current | 08:27, 17 April 2022 |
![]() | 512 × 2,560 (8 KB) | Djiboun | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for fr. |
13:18, 20 June 2020 |
![]() | 512 × 2,560 (5 KB) | Mega deppa | Reverted to version as of 16:52, 9 October 2011 (UTC) | |
13:16, 20 June 2020 |
![]() | 512 × 2,560 (8 KB) | Mega deppa | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for ja. | |
16:52, 9 October 2011 |
![]() | 512 × 2,560 (5 KB) | Cmglee | Align text, change enumeration and change colour to match Image:CMOS_fabrication_process.svg. | |
22:03, 30 September 2011 |
![]() | 512 × 2,560 (5 KB) | Cmglee | Merge develop and remove exposed photoresist. | |
22:46, 29 September 2011 |
![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:39, 29 September 2011 |
![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:37, 29 September 2011 |
![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:30, 29 September 2011 |
![]() | 512 × 3,413 (5 KB) | Cmglee | {{Information |Description ={{en|1=Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. }} |Source ={{own}} |Author = Cmglee |Date |
The following other wikis use this file: