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Identifiers | |||
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3D model (
JSmol)
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ChemSpider | |||
PubChem
CID
|
|||
CompTox Dashboard (
EPA)
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Properties | |||
F2H2Si | |||
Molar mass | 68.098 g·mol−1 | ||
Appearance | colourless gas | ||
Melting point | −122 °C (−188 °F; 151 K) | ||
Boiling point | −77.8 °C (−108.0 °F; 195.3 K) | ||
Thermochemistry [1] | |||
Std molar
entropy (S⦵298) |
262.12 J/mol•K | ||
Std enthalpy of
formation (ΔfH⦵298) |
-790.78 kJ/mol | ||
Except where otherwise noted, data are given for materials in their
standard state (at 25 °C [77 °F], 100 kPa).
|
Difluorosilane is a gaseous chemical compound with formula SiH2F2. It can be considered as a derivative of silane with two hydrogen atoms replaced with fluorine.
Difluorosilane can be made by fluorinating dichlorosilane with antimony trifluoride. [2] [3]
Some is also made in a reaction of silicon tetrafluoride with hydrogen
Traces of difluorosilane are made when coal is burnt. [4]
Difluorosilane is a gas with boiling point −77.8 °C, and a freezing point of −122 °C. It has no colour. The silicon–fluorine bond length in difluorosilane is 1.358 Å which is greater than that in fluorosilane but less than the length in trifluorosilane. [5]
In an electric discharge, hydrogen atoms are preferentially removed from the molecule and SiHF2SiHF2 is formed along with hydrogen. [3]
At elevated temperatures, difluorosilane can disproportionate by swapping hydrogen and fluorine atoms between molecules to form fluorosilane and trifluorosilane. [5]
Difluorosilane is used in dental varnish in order to prevent tooth cavities. [6]
Difluorosilane is also used in chemical vapour deposition to deposit silicon nitride films.
{{
cite journal}}
: Cite journal requires |journal=
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| |||
Identifiers | |||
---|---|---|---|
3D model (
JSmol)
|
|||
ChemSpider | |||
PubChem
CID
|
|||
CompTox Dashboard (
EPA)
|
|||
| |||
| |||
Properties | |||
F2H2Si | |||
Molar mass | 68.098 g·mol−1 | ||
Appearance | colourless gas | ||
Melting point | −122 °C (−188 °F; 151 K) | ||
Boiling point | −77.8 °C (−108.0 °F; 195.3 K) | ||
Thermochemistry [1] | |||
Std molar
entropy (S⦵298) |
262.12 J/mol•K | ||
Std enthalpy of
formation (ΔfH⦵298) |
-790.78 kJ/mol | ||
Except where otherwise noted, data are given for materials in their
standard state (at 25 °C [77 °F], 100 kPa).
|
Difluorosilane is a gaseous chemical compound with formula SiH2F2. It can be considered as a derivative of silane with two hydrogen atoms replaced with fluorine.
Difluorosilane can be made by fluorinating dichlorosilane with antimony trifluoride. [2] [3]
Some is also made in a reaction of silicon tetrafluoride with hydrogen
Traces of difluorosilane are made when coal is burnt. [4]
Difluorosilane is a gas with boiling point −77.8 °C, and a freezing point of −122 °C. It has no colour. The silicon–fluorine bond length in difluorosilane is 1.358 Å which is greater than that in fluorosilane but less than the length in trifluorosilane. [5]
In an electric discharge, hydrogen atoms are preferentially removed from the molecule and SiHF2SiHF2 is formed along with hydrogen. [3]
At elevated temperatures, difluorosilane can disproportionate by swapping hydrogen and fluorine atoms between molecules to form fluorosilane and trifluorosilane. [5]
Difluorosilane is used in dental varnish in order to prevent tooth cavities. [6]
Difluorosilane is also used in chemical vapour deposition to deposit silicon nitride films.
{{
cite journal}}
: Cite journal requires |journal=
(
help)