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Names | |
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Preferred IUPAC name
Chlorotri(fluoro)silane | |
Other names
silicon chlorotrifluoride
[1]
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Identifiers | |
3D model (
JSmol)
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ChemSpider | |
PubChem
CID
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CompTox Dashboard (
EPA)
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|
| |
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Properties | |
ClF3Si | |
Molar mass | 120.53371 |
Appearance | colorless gas |
Density | 1.31 g/mL |
Melting point | −138 °C (−216 °F; 135 K) |
Boiling point | critical point 303.7 K at 3.46 MPa |
reacts | |
Vapor pressure | 16600 |
Refractive index (nD)
|
1.279 |
Structure | |
distorted tetrahedron | |
0.636 D(gas) | |
Related compounds | |
Related compounds
|
tetrafluorosilane dichlorodifluorosilane |
Except where otherwise noted, data are given for materials in their
standard state (at 25 °C [77 °F], 100 kPa).
|
Chlorotrifluorosilane is an inorganic gaseous compound with formula SiClF3 composed of silicon, fluorine and chlorine. It is a silane that substitutes hydrogen with fluorine and chlorine atoms.
By heating a mixture of anhydrous aluminium chloride and sodium hexafluorosilicate to between 190 and 250 °C a mixture of gases containing chlorotrifluorosilane is given off. These are condensed at -196 °C degrees and fractionally distilled at temperatures up to -78 °C. [2]
SiClF3 can be made by reacting silicon tetrachloride and silicon tetrafluoride gases at 600 °C, producing a mixture of fluorochlorosilanes including about one quarter SiClF3. [3]
SiClF3 can be made by reacting silicon tetrachloride with antimony trifluoride. An antimony pentachloride catalyst assists. The products are distilled to separate it out from tetrafluorosilane and dichlorodifluorosilane. [4] [5] [6]
At high temperatures above 500 °C silicon tetrafluoride can react with phosphorus trichloride to yield some SiClF3. This is unusual because SiF4 is very stable. [7]
Silicon tetrachloride can react with trifluoro(trichloromethyl)silane to yield SiClF3 and CCl3SiCl3. [8]
2-Chloroethyltrifluorosilane or 1,2-dichloroethyltrifluorosilane can be disassociated by an infrared laser to yield SiClF3 and C2H4 ( ethylene) or vinyl chloride. By tuning the laser to a vibration frequency of a particular isotope of silicon, different isotopomers can be selectively broken up in order to have a product that only concentrates one isotope of silicon. So silicon-30 can be increased to 80% by using the 934.5 cm−1 line in a CO2 laser. [9]
The first published preparation of SiClF3 by Schumb and Gamble was by exploding hexafluorodisilane in chlorine: Si2F6 + Cl2 → 2SiClF3. Other products of this explosion may include amorphous silicon, SiCl2F2 and SiF4. [10]
Chlorine reacts with silicon tetrafluoride in the presence of aluminium chips at 500-600 °C to make mostly silicon tetra chloride and some SiClF3. [11]
Mercuric chloride when heated with SiF3Co(CO)4 breaks the bond to form a 90% yield of SiClF3. [12]
The combination of SiF4 and chlorodimethylphosphine yields some SiClF3. [13]
Trifluorosilane SiHF3 reacts with gaseous chlorine to yield SiClF3 and HCl. [14]
Bond length for Si–Cl is 1.996 Å and for Si–F is 1.558 Å. The bond angle ∠FSiCl = 110.2° and ∠FSiF = 108.7°. [4] The bond length between silicon and chlorine is unusually short, indicating a 31% double bond. This can be explained by the more ionic fluoride bonds withdrawing some charge allowing a partial positive charge on the chlorine. [15]
The molecular dipole moment is 0.636 Debye. [4]
Between 129.18 and 308.83 K the vapour pressure in mm Hg at temperature T in K is given by log10 P = 102.6712 -2541.6/T -43.347 log10 T + 0.071921T -0.000045231 T2. [16]
The heat of formation of chlorotrifluorosilane is -315.0 kcal/mol at 298K. [17]
Chlorotrifluorosilane is hydrolysed by water to produce silica.
Chlorotrifluorosilane reacts with trimethylstannane ((CH3)3SnH) at room temperature to make trifluorosilane in about 60 hours. [18]
Proposed uses include a dielectric gas with a high breakdown voltage, and low global warming potential, a precursor for making fluorinated silica soot, and a vapour deposition gas.
Chlorotrifluorosilane can form an addition compound with pyridine with formula SiClF3.2py (py=pyridine) [19] An addition compound with trimethylamine exists. [20] [21] This addition compound is made by mixing trimethylamine vapour with Chlorotrifluorosilane and condensing out a solid at -78 °C. If this was allowed to soak in trimethylamine liquid for over eight hours, a diamine complex formed (2Me3N·SiClF3). [21] At 0° the disassociation pressure of the monoamine complex was 23 mm Hg. [21]
SiClF3− is a trigonal bipyramidal shape with a Cl and F atom on the axis. It is formed when gamma rays hit the neutral molecule. [22]
Chlorotetrafluorosilicate (IV) (SiClF4−) can form a stable a pale yellow crystalline compound tetraethylammonium chlorotetrafluorosilicate. [23]
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cite book}}
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![]() | |
Names | |
---|---|
Preferred IUPAC name
Chlorotri(fluoro)silane | |
Other names
silicon chlorotrifluoride
[1]
| |
Identifiers | |
3D model (
JSmol)
|
|
ChemSpider | |
PubChem
CID
|
|
CompTox Dashboard (
EPA)
|
|
| |
| |
Properties | |
ClF3Si | |
Molar mass | 120.53371 |
Appearance | colorless gas |
Density | 1.31 g/mL |
Melting point | −138 °C (−216 °F; 135 K) |
Boiling point | critical point 303.7 K at 3.46 MPa |
reacts | |
Vapor pressure | 16600 |
Refractive index (nD)
|
1.279 |
Structure | |
distorted tetrahedron | |
0.636 D(gas) | |
Related compounds | |
Related compounds
|
tetrafluorosilane dichlorodifluorosilane |
Except where otherwise noted, data are given for materials in their
standard state (at 25 °C [77 °F], 100 kPa).
|
Chlorotrifluorosilane is an inorganic gaseous compound with formula SiClF3 composed of silicon, fluorine and chlorine. It is a silane that substitutes hydrogen with fluorine and chlorine atoms.
By heating a mixture of anhydrous aluminium chloride and sodium hexafluorosilicate to between 190 and 250 °C a mixture of gases containing chlorotrifluorosilane is given off. These are condensed at -196 °C degrees and fractionally distilled at temperatures up to -78 °C. [2]
SiClF3 can be made by reacting silicon tetrachloride and silicon tetrafluoride gases at 600 °C, producing a mixture of fluorochlorosilanes including about one quarter SiClF3. [3]
SiClF3 can be made by reacting silicon tetrachloride with antimony trifluoride. An antimony pentachloride catalyst assists. The products are distilled to separate it out from tetrafluorosilane and dichlorodifluorosilane. [4] [5] [6]
At high temperatures above 500 °C silicon tetrafluoride can react with phosphorus trichloride to yield some SiClF3. This is unusual because SiF4 is very stable. [7]
Silicon tetrachloride can react with trifluoro(trichloromethyl)silane to yield SiClF3 and CCl3SiCl3. [8]
2-Chloroethyltrifluorosilane or 1,2-dichloroethyltrifluorosilane can be disassociated by an infrared laser to yield SiClF3 and C2H4 ( ethylene) or vinyl chloride. By tuning the laser to a vibration frequency of a particular isotope of silicon, different isotopomers can be selectively broken up in order to have a product that only concentrates one isotope of silicon. So silicon-30 can be increased to 80% by using the 934.5 cm−1 line in a CO2 laser. [9]
The first published preparation of SiClF3 by Schumb and Gamble was by exploding hexafluorodisilane in chlorine: Si2F6 + Cl2 → 2SiClF3. Other products of this explosion may include amorphous silicon, SiCl2F2 and SiF4. [10]
Chlorine reacts with silicon tetrafluoride in the presence of aluminium chips at 500-600 °C to make mostly silicon tetra chloride and some SiClF3. [11]
Mercuric chloride when heated with SiF3Co(CO)4 breaks the bond to form a 90% yield of SiClF3. [12]
The combination of SiF4 and chlorodimethylphosphine yields some SiClF3. [13]
Trifluorosilane SiHF3 reacts with gaseous chlorine to yield SiClF3 and HCl. [14]
Bond length for Si–Cl is 1.996 Å and for Si–F is 1.558 Å. The bond angle ∠FSiCl = 110.2° and ∠FSiF = 108.7°. [4] The bond length between silicon and chlorine is unusually short, indicating a 31% double bond. This can be explained by the more ionic fluoride bonds withdrawing some charge allowing a partial positive charge on the chlorine. [15]
The molecular dipole moment is 0.636 Debye. [4]
Between 129.18 and 308.83 K the vapour pressure in mm Hg at temperature T in K is given by log10 P = 102.6712 -2541.6/T -43.347 log10 T + 0.071921T -0.000045231 T2. [16]
The heat of formation of chlorotrifluorosilane is -315.0 kcal/mol at 298K. [17]
Chlorotrifluorosilane is hydrolysed by water to produce silica.
Chlorotrifluorosilane reacts with trimethylstannane ((CH3)3SnH) at room temperature to make trifluorosilane in about 60 hours. [18]
Proposed uses include a dielectric gas with a high breakdown voltage, and low global warming potential, a precursor for making fluorinated silica soot, and a vapour deposition gas.
Chlorotrifluorosilane can form an addition compound with pyridine with formula SiClF3.2py (py=pyridine) [19] An addition compound with trimethylamine exists. [20] [21] This addition compound is made by mixing trimethylamine vapour with Chlorotrifluorosilane and condensing out a solid at -78 °C. If this was allowed to soak in trimethylamine liquid for over eight hours, a diamine complex formed (2Me3N·SiClF3). [21] At 0° the disassociation pressure of the monoamine complex was 23 mm Hg. [21]
SiClF3− is a trigonal bipyramidal shape with a Cl and F atom on the axis. It is formed when gamma rays hit the neutral molecule. [22]
Chlorotetrafluorosilicate (IV) (SiClF4−) can form a stable a pale yellow crystalline compound tetraethylammonium chlorotetrafluorosilicate. [23]
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has generic name (
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