This article needs additional citations for
verification. (September 2015) |
Semiconductor device fabrication |
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MOSFET scaling ( process nodes) |
Future
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The 1 μm process (1 micrometer process) is a level of MOSFET semiconductor process technology that was commercialized around the 1984–1986 timeframe, [1] [2] by companies like NTT, NEC, Intel and IBM. It was the first process where CMOS was common (as opposed to NMOS).
The 1 μm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 1 micrometers wide.
The earliest MOSFET with a 1 μm NMOS channel length was fabricated by a research team led by Robert H. Dennard, Hwa-Nien Yu and F.H. Gaensslen at the IBM T.J. Watson Research Center in 1974. [3]
Preceded by 1.5 μm process |
MOSFET semiconductor device fabrication process | Succeeded by 800 nm process |
This article needs additional citations for
verification. (September 2015) |
Semiconductor device fabrication |
---|
MOSFET scaling ( process nodes) |
Future
|
The 1 μm process (1 micrometer process) is a level of MOSFET semiconductor process technology that was commercialized around the 1984–1986 timeframe, [1] [2] by companies like NTT, NEC, Intel and IBM. It was the first process where CMOS was common (as opposed to NMOS).
The 1 μm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 1 micrometers wide.
The earliest MOSFET with a 1 μm NMOS channel length was fabricated by a research team led by Robert H. Dennard, Hwa-Nien Yu and F.H. Gaensslen at the IBM T.J. Watson Research Center in 1974. [3]
Preceded by 1.5 μm process |
MOSFET semiconductor device fabrication process | Succeeded by 800 nm process |